MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202617093358 A) filed by Nof Corporation on July 31, 2026, for Anti-Fogging Agent Composition And Anti-Fogging Article Having Anti-Fogging Film Formed From Said Composition.
Inventor includes Hashimoto,kazuki.
The application for the patent was published on October 30, 2026, under issue no. 44/2026.
Abstract: This anti-fogging agent composition contains a copolymer (A), a polyfunctional block isocyanate compound (B), a surfactant (C), and a solvent (D), wherein the solvent (D) contains a dihydric alcohol (D-1) and a glycol ether (D-2) with the content of (D-1) being 5-35 parts by mass and the content of (D-2) being 3-15 parts by mass with respect to 100 parts by mass of the anti-fogging agent composition, and the mass ratio [(D-1)/(D-2) ] of (D-1) to (D-2) being 0.5-8.0. This anti-fogging agent composition provides an anti-fogging film formed by heat curing that excels in appearance, adhesion, anti-fogging performance, and water streaking marks, and can suppress dripping or brush marks during coating, and can suppress solvent cracking when performing heat curing at a high temperature.
Disclaimer: Curated by HT Syndication.
