MUMBAI, India, June 26 -- Intellectual Property India has published a patent application (202617065707 A) filed by W. R. Grace & Co. -Conn. on May 25, 2026, for Anionic Functionalized Colloidal Silica And Methods Of Production.
Inventor includes Gu, Feng.
The application for the patent was published on June 19, 2026, under issue no. 25/2026.
Abstract: The present disclosure is directed to compositions that include water and a functionalized colloidal silica, where the functionalized colloidal silica includes silica particles (where each silica particle includes a surface) as well as a structural units according to Formula I, Formula II, Formula III, and/or Formula IV (I) (II) (III) (IV) The present disclosure also is directed to methods of making compositions of the present technology.
Disclaimer: Curated by HT Syndication.
