MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202611085054 A) filed by Indian Institute Of Technology Banaras Hindu University, Varanasi on July 10, 2026, for An Organosiloxane Based Coating Composite Material And A Method Of Preparation Thereof.

Inventors include Pralay Maiti; Kheyanath Mitra; Anupama Devi; and Subham Sekhar Mandal.

The application for the patent was published on October 30, 2026, under issue no. 44/2026.

Abstract: The present invention relates to an organosiloxane based coating composite comprising a silicon polymer solution, and a plurality of hollow silica microspheres via in situ polymerization of dichorodiphenylsilane in presence of pre-weighted hollow silica microsphere that exhibits an enhanced thermal stability and increased shelf life, mechanical strength, enhanced peel strength and scratch hardness for extensive applications in the field of engineering and technology. Figure 1 on sheet no.1 of the drawings may accompany the abstract when published.

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