MUMBAI, India, Sept. 7 -- Intellectual Property India has published a patent application (202541059503 A) filed by Nopo Nanotechnologies India Private Limited on June 20, 2025, for An Improved Mixing Apparatus For Hipco Reactor.
Inventors include Gadhadar Reddy; Aakib Memon; and Prudhvi Simhadri.
The application for the patent was published on September 04, 2026, under issue no. 36/2026.
Abstract: AN IMPROVED MIXING APPARATUS FOR HIPCO REACTOR The invention provides an improved mixing apparatus for a HiPCO reactor including a first inlet 1 for receiving hot gas, a second inlet 3 for receiving cold gas positioned downstream of the first inlet 1, an outlet 5 for residence of gases from both inlets, and a nozzle 7 sandwiched between the first inlet 1 and outlet 5. The nozzle 7 includes a convergent section 7a connected to the first inlet 1, a throat 7b, and a divergent section 7c connected to the outlet 5. The convergent section 7a and divergent section 7c are engineered for specific gas flow conditions to achieve an outlet pressure approximately 0.545 times the inlet pressure, enabling supersonic gas velocities. The convergent-divergent nozzle design enables injection of hot gases at Mach 1.0 to supersonic velocities into a mixing zone located downstream of the nozzle throat 7b. The second inlet 3 injects cold gas carrying catalyst radially/perpendicularly into the hot gas in the mixing zone, enabling turbulent mixing via shear layers and shock interactions within 1-5 microseconds, critical for SWCNT formation in the HiPCO process. FIG.1
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