MUMBAI, India, July 7 -- Intellectual Property India has published a patent application (202617069687 A) filed by Agfa-Gevaert Nv on June 03, 2026, for An Etch Resist Inkjet Ink.
Inventors include Cortes Salazar, Fernando; and Loccufier, Johan.
The application for the patent was published on July 03, 2026, under issue no. 27/2026.
Abstract: An etch resist inkjet ink comprising: - one or more photoinitiators, wherein at least one photoinitiator is a thioxantone compound, - one or more acrylamides according to Formula (I), wherein R represents H or CH3; R1 and R2 independently from each other represent an optionally substituted alkyl group; R1 and R2 may represent the necessary atom to form a 5 or 6 membered ring; - one or more polymerizable compounds according to Formula (II), and wherein X = O, S or NH; R = H or CH3; L is an optionally substituted one to five atomic group divalent linking group; n is 0 or 1; and A is an optionally substituted aromatic group; - one or more polyfunctional (meth)acrylates.
Disclaimer: Curated by HT Syndication.
