MUMBAI, India, June 30 -- Intellectual Property India has published a patent application (202641076187 A) filed by Sr University on June 19, 2026, for An Ai/Ml-Based Dynamic Plant Layout Optimization System For Drone Manufacturing.
Inventors include Packiaraj C; and Dr. Damarla Ramesh Babu.
The application for the patent was published on June 26, 2026, under issue no. 26/2026.
Abstract: AN AI/ML-BASED DYNAMIC PLANT LAYOUT OPTIMIZATION SYSTEM FOR DRONE MANUFACTURING This paper presents an AI/ML-based system designed to optimize drone manufacturing plant layouts through intelligent data integration, advanced modeling, and adaptive optimization. The system ingests and processes diverse operational data from ERP, MES, IoT sensors, CAD/BIM software, and production schedules, enabling real-time responsiveness. It incorporates application-specific production modeling to address unique requirements across drone categories such as agriculture, defense, surveillance, land survey, and meteorology. At its core, the optimization engine leverages reinforcement learning, deep learning, genetic algorithms, and simulation-based methods to achieve multi- objective optimization, balancing throughput, cycle time, space utilization, and flexibility under physical and regulatory constraints. A digital twin module provides dynamic 3D visualization, real-time monitoring, and scenario simulation, while the recommendation and adaptive control module generates actionable layout proposals, supports reconfiguration planning, and integrates predictive maintenance. By combining AI-driven optimization with digital twin technology, the system enables continuous improvement, adaptability to market demands, and enhanced efficiency in drone manufacturing operations.
Disclaimer: Curated by HT Syndication.
