MUMBAI, India, Sept. 28 -- Intellectual Property India has published a patent application (202641112622 A) filed by Sathishkumar Natesan; Dr. M.; Bibish Gopinath Piyo; Balaji T; Abiyu Johan Jh; Gomathi Jeyam. S; Bala Yogeswari. K; Rajesh K; S. Abdul Raheem; Abisheaksamy M; Abhijit David; and Sanjai M on September 19, 2026, for An Ai-Driven Self-Optimizing Manufacturing System Using Digital Twin, Predictive Analytics And Adaptive Process Control.
Inventors include Dr. M. Arun; Bibish Gopinath Piyo; Balaji T; Abiyu Johan Jh; Gomathi Jeyam. S; Bala Yogeswari. K; Rajesh K; S. Abdul Raheem; Abisheaksamy M; Abhijit David; and Sanjai M.
The application for the patent was published on September 25, 2026, under issue no. 39/2026.
Abstract: The present invention relates to an artificial intelligence driven self-optimizing manufacturing system capable of predicting process variations and automatically improving manufacturing performance. The invention integrates a digital twin model, multi-source sensor acquisition, artificial intelligence based prediction, adaptive process control and continuous learning mechanisms. The system continuously analyzes machine condition, process parameters, environmental factors and product quality information to predict possible deviations before failure occurs. Based on prediction results, the system automatically adjusts manufacturing parameters to maintain accuracy, reduce downtime, improve productivity and enable intelligent factory operation.
Disclaimer: Curated by HT Syndication.
