MUMBAI, India, Sept. 28 -- Intellectual Property India has published a patent application (202647110505 A) filed by Entegris, Inc. on September 15, 2026, for Aluminum-Containing Inhibitor Compounds For Selective Deposition.
Inventors include Cameron, Thomas M.; and Hood, Drew Michael.
The application for the patent was published on September 25, 2026, under issue no. 39/2026.
Abstract: Aluminum-containing inhibitor compounds for selective deposition are provided. A method for selective deposition comprises obtaining a substrate having a first surface and a second surface, exposing the substrate to an Al-containing inhibitor to modify the first surface, and selectively depositing a film on the second surface. The aluminum-containing inhibitor compound is a compound comprising a substituted aluminum alkyl. Related systems, related compositions, and related devices, among other things, are further provided.
Disclaimer: Curated by HT Syndication.
