MUMBAI, India, Aug. 24 -- Intellectual Property India has published a patent application (202641098377 A) filed by Dr. Ashok Kumar M; Mr. Sarvesh S; Mr. Shri Hari S; Mr. Sanjaiy K; Ms. Thanusigashri J; Ms. Rakkshna A; and Mr. Siddharth T on August 14, 2026, for Ai-Enabled Embedded System For Real-Time Fabric Defect Prediction And Corrective Process Control.
Inventors include Dr. Ashok Kumar M; Mr. Sarvesh S; Mr. Shri Hari S; Mr. Sanjaiy K; Ms. Thanusigashri J; Ms. Rakkshna A; and Mr. Siddharth T.
The application for the patent was published on August 21, 2026, under issue no. 34/2026.
Abstract: AI-enabled embedded system for real-time fabric defect prediction and corrective process control Abstract: A system and method for automated fabric defect detection and root cause analysis in textile manufacturing. The system utilizes an edge-AI processing architecture centered around an ESP32 microcontroller unit (MCU). It integrates an image-capturing camera with multiple operational sensors monitoring yarn tension, machine speed, vibration, temperature, humidity, and roller pressure. By fusing visual data with sensor parameters, the edge-AI system identifies fabric defects in real-time, forecasts their likely root causes, and computes confidence scores. If a defect risk exceeds a predetermined limit, the system issues actionable warnings or corrective instructions. A built-in continuous feedback mechanism refines the AI model over time, thereby minimizing material waste, reducing machine downtime, and decreasing the reliance on manual inspection.
Disclaimer: Curated by HT Syndication.
