MUMBAI, India, Oct. 12 -- Intellectual Property India has published a patent application (202641119761 A) filed by Rajeev Gandhi Memorial College Of Engineering & Technology Autonomous on October 06, 2026, for Ai-Enabled Deep Learning System For Intelligent Pattern Recognition, Risk Assessment, And Predictive Analytics.
Inventors include Mr. Manjula Mahendra; and Dr. Rajaboina Raja Kumar.
The application for the patent was published on October 09, 2026, under issue no. 41/2026.
Abstract: An artificial-intelligence-enabled deep learning system for intelligent pattern recognition, risk assessment, and predictive analytics is disclosed. A deep learning pattern- recognition engine processes data of a monitored domain, recognizing patterns, relationships, and anomalies, including complex, subtle, and novel ones that statistical and rule-based methods miss, by a deep neural network, convolutional, recurrent, transformer, graph, or autoencoder, and produces a common learned representation. A risk-assessment engine assesses, from the recognized patterns and the representation, a risk, its nature, likelihood, and severity of an adverse outcome. A predictive- analytics engine predicts, from the recognized patterns, the assessed risk, and the representation, a future outcome, event, or condition before it occurs. The three engines are integrated in a unified pipeline upon the common learned representation, the recognition feeding the assessment and the recognition and assessment feeding the prediction, so they are performed together and consistently, each informing the others, optionally trained end-to-end, in contrast to the fragmented, separate, inconsistent analysis of the prior art. An application module applies the recognition, assessment, and prediction to a decision or action, alert, recommendation, control, or intervention, producing a concrete result in the domain's operation.
Disclaimer: Curated by HT Syndication.
