MUMBAI, India, June 26 -- Intellectual Property India has published a patent application (202617028098 A) filed by Kureha Corporation on March 10, 2026, for Agent For Improving Plant Non-Biological Stress Resistance, Method For Improving Non-Biological Stress Resistance, Preparation For Improving Non-Biological Stress Resistance, Product For Improving Non-Biological Stress Resistance, And Plant.
Inventors include Higashiyama, Yukihiro; Jimbo, Yusuke; Tetsu, Naoki; and Koshiyama, Tatsuyuki.
The application for the patent was published on June 19, 2026, under issue no. 25/2026.
Abstract: Provided is an agent for improving plant non-biological stress resistance, the agent being capable of further enhancing the effect of improving the non-biological stress resistance by using a compound, such as ergothioneine. An agent for improving plant non-biological stress resistance according to the present invention contains: a first component, which is a compound represented by formula (I), a tautomer thereof, or an agriculturally acceptable salt thereof; and a second component, which is at least one substance selected from the group consisting of amino acids, peptides having an amino acid length of 2-10, betaine, organic acids or salts thereof, nucleic acid bases, vitamins, and sugars or sugar alcohols. (In formula (I), each of R1 and R2 independently represents a hydrogen atom or an alkyl group having 1-4 carbon atoms, and each of R3, R4, and R5 independently represents an alkyl group having 1-4 carbon atoms.)
Disclaimer: Curated by HT Syndication.
