MUMBAI, India, July 7 -- Intellectual Property India has published a patent application (202641076998 A) filed by Indian Institute Of Science on June 22, 2026, for A System And A Method For Aligning An Optical Lithography System Using A Multi-Target System.
Inventors include Das Gupta, Tapajyoti; Yeleshetty, Aravindkumar; Vailshery D C, Mark; and Raina, Ritvik.
The application for the patent was published on July 03, 2026, under issue no. 27/2026.
Abstract: The present invention relates to an integrated optical lithography system and method for alignment and focusing during lithographic patterning. The system comprises a light projection source configured to generate an exposure beam directed toward a projection plane and an objective optically coupled to the light projection source. A dichroic element is positioned in the optical train to transmit the exposure beam at a first wavelength toward a substrate while reflecting light at a second wavelength. An image sensor, optically coupled to the dichroic element through a beam splitter, receives the reflected light. A multi-target system comprising a plurality of reference targets with reference patterns is positioned at different axial locations relative to the projection plane. An alignment light source emits alignment light at the second wavelength through the reference targets, such that the reflected alignment light forms reference images on the image sensor. The reference images enable determination of focal plane and defocus direction without activating the exposure beam, allowing accurate alignment, autofocusing, and optional real-time monitoring of projected patterns in optical lithography systems. [
Disclaimer: Curated by HT Syndication.
