MUMBAI, India, Sept. 28 -- Intellectual Property India has published a patent application (202611092957 A) filed by Thapar Institute Of Engineering & Technology on July 31, 2026, for A System, And Method For Garment Disposal Management.

Inventors include Sethi, Arpita; Trishti; Mehta, Vansh; and Nijhawan, Rahul.

The application for the patent was published on September 25, 2026, under issue no. 39/2026.

Abstract: The present invention provides a system, and method for garment disposal management. The system comprises an interface and a processing unit communicatively coupled to the interface. The interface is configured to read a machine-readable code integrated with a garment to determine a garment identification reference, and to capture at least one image of the garment, and the processing unit is configured to receive and analyze the at least one captured image of the garment to determine a damage score of the garment. The processing unit is also configured to receive a wash count corresponding to the determined garment identification reference, determine a garment condition score based on the received wash count and determined damage score of the garment, and provide, through the interface, a garment disposal recommendation based on the determined garment condition score.

Disclaimer: Curated by HT Syndication.