Intellectual Property India Publishes Patent Application for A Process For Fabricating Low Resistive And Transparent Multifunctional Tio2 Thin Films And The Tio2 Thin Films Produced Thereby.

MUMBAI, India, Aug. 31 -- Intellectual Property India has published a patent application (202541100240 A) filed by University Of Kerala on October 16, 2025, for A Process For Fabricating Low Resistive And Transparent Multifunctional Tio2 Thin Films And The Tio2 Thin Films Produced Thereby..

Inventors include Dr. Deepa K. G.; and Heera S.

The application for the patent was published on August 28, 2026, under issue no. 35/2026.

Abstract: A process for fabricating low resistive and transparent multifunctional TiO2 thin films and the TiO2 thin films produced thereby. A process for fabricating low resistive and transparent multifunctional TiO2 thin films comprising the steps of depositing on a substrate by DC sputtering, at least a film in oxide mode deposition and a film thereon in metallic mode deposition, to form a TiO2 film, followed by annealing the film at a temperature in the range of 600-700?C under a pressure of 1 x 10-5 mbar to obtain the TiO2 thin films. Fig. 1

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