MUMBAI, India, Sept. 28 -- Intellectual Property India has published a patent application (202611099121 A) filed by Indian Institute Of Technology Roorkee on August 17, 2026, for A Passive Cleaning System For A Photovoltaic Panel And A Method Thereof.
Inventors include Meena, Khushal; Singh, Madhu; Manpreet; Choudhary, Megha; Choudhary, Siddharth; Raj, Harsh; Sarangi, Rabindranath; and Das, Arup Kumar.
The application for the patent was published on September 25, 2026, under issue no. 39/2026.
Abstract: A passive cleaning system (100) and method (200) for a photovoltaic panel includes a photovoltaic panel (102) having an inclined light-receiving surface provided with a hydrophobic coating; a fluid reservoir (104) containing a cleaning fluid is configured above an upper edge of the light-receiving surface at a predefined height. The fluid reservoir (104) includes a perforated surface (104A) having holes across a width thereof. Further, includes a porous flow-resistance layer (106) disposed in the fluid reservoir (104), submerged in the cleaning fluid. The porous flow-resistance layer (106) sits on inner surface of the perforated surface (104A) for uniform release of the cleaning fluid through the holes as individual droplets under gravity on to the light-receiving surface. The individual droplets falling from the predetermined height upon contacting the light-receiving surface, spreads over the light-receiving surface and removes deposited dust from the light-receiving surface while rolling downward under gravity therefrom.
Disclaimer: Curated by HT Syndication.
