MUMBAI, India, June 19 -- Intellectual Property India has published a patent application (202617057825 A) filed by The University Of Sheffield on May 06, 2026, for A Method Of Manufacturing Porous Silicon.
Inventors include Yan, Maximilian; and Patwardhan, Siddharth.
The application for the patent was published on June 05, 2026, under issue no. 23/2026.
Abstract: A method of manufacturing porous silicon comprising providing magnesium silicide with silica nanoparticles and silica microparticles or by providing magnesium with silica nanoparticles and silica microparticles. Either mixture is then heated up to 500°C.
Disclaimer: Curated by HT Syndication.
