MUMBAI, India, July 24 -- Intellectual Property India has published a patent application (202441102005 A) filed by Manipal Academy Of Higher Education on June 23, 2025, for A Method For Recovering And Purifying Kish Graphite From Blast Furnace Dust.
Inventors include Ankitha Rao; Somashekara Bhat; and Shounak De.
The application for the patent was published on July 17, 2026, under issue no. 29/2026.
Abstract: The innovation introduces a method for the effective recovery and purification of kish graphite (KG) from industrial blast furnace dust, employing a mix of straightforward, economical, and eco-friendly procedures. The technique employs magnetic separation, decantation with deionized water, and acid leaching to target impurities for removal and improve the purity of the extracted graphite. The purified KG flakes undergo additional refinement through horn sonication, and ascorbic acid is utilized for the environmentally friendly reduction of graphene oxide to reduced graphene oxide (rGO). This method greatly lowers operational expenses, energy usage, and ecological footprint in comparison to conventional techniques. The method offers a scalable, sustainable method for generating high-purity kish graphite, rendering it ideal for advanced uses like graphene-based electronics, energy storage methods, and additive manufacturing, while enhancing resource efficiency and supporting environmentally-friendly practices in industrial processes. (FIG.1)
Disclaimer: Curated by HT Syndication.
