MUMBAI, India, Aug. 31 -- Intellectual Property India has published a patent application (202611068137 A) filed by Prof. M. S. Gaur on May 30, 2026, for A Method For Optimizing Nanoparticle Size Reduction In A Polymer Matrix Using Afm-Based Quantitative Analysis.
Inventors include Prof. M. S. Gaur; Dr. R. K. Tiwari; Dr. Pramod Kumar Singh; Dr. Rohan Sagar; and Dr. Kavita Arora.
The application for the patent was published on August 28, 2026, under issue no. 35/2026.
Abstract: The present invention discloses a method for optimizing nanoparticle size reduction in a polymer matrix using Atomic Force Microscopy (AFM). The method involves controlled dispersion of nanoparticles using a surfactant, followed by sonication and film formation. A quantitative AFM-based analysis identifies a critical surfactant concentration that results in a non-linear and unexpected reduction in nanoparticle size. The invention provides improved dispersion and morphology and is applicable in advanced material systems. Fig. 1
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