MUMBAI, India, June 30 -- Intellectual Property India has published a patent application (202431101885 A) filed by Iit Guwahati Technology Innovation And Development Foundation; and Indian Institute Of Technology, Guwahati on December 23, 2024, for A Method For Fabricating Layered Graphene.
Inventors include Aminul Islam; Saptarshi Dutta; Ankur Gupta; Yogesh Tripathi; Narayanan V; Ravindra Kumar Jha; and Santosha Kumar.
The application for the patent was published on June 26, 2026, under issue no. 26/2026.
Abstract: A method for fabricating layered graphene is disclosed. Said method broadly comprises following steps: synthesising graphene ink (4) by mixing graphene powder with a resin; spraying the graphene ink (4) onto a substrate (3) with an ink sprayer (5), curing with UV light to obtain a single graphene layer; patterning; and drying in a hot air oven. The disclosed method offers at least the following advantages and effects: is industrial friendly; cost-effective; is simple in nature; high yield (about 99.3%); offers renewability and reuseability without loss of printing efficiency; offers high scalability; retains requisite structural, electrical, mechanical properties; and/or exhibits hydrophobic nature for commercial and underwater applications.
Disclaimer: Curated by HT Syndication.
