MUMBAI, India, Sept. 22 -- Intellectual Property India has published a patent application (202641102084 A) filed by Manipal Academy Of Higher Education on August 24, 2026, for A Method And System For Preparing Mesophase Pitch Using A Precursor-Derived Nucleating Material.
Inventors include Rajashekhar Pujar; and Anusree M.
The application for the patent was published on September 18, 2026, under issue no. 38/2026.
Abstract: The present invention relates to a mesophase pitch (100) and to a method and system for preparing the mesophase pitch (100). The mesophase pitch (100) comprises carbon precursor material (101) and graphitic nucleation centres (109) dispersed within the carbon precursor material (101), the graphitic nucleation centres (109) being provided by graphitic carbon (109) generated from the carbon precursor material (101) itself by laser irradiation, either directly within a molten carbon precursor material (101) or by laser irradiation of a separate portion of the carbon precursor material (101) which is finely powdered and introduced into the carbon precursor material (101) in a molten state. Since the graphitic carbon (109) is generated from the same carbon precursor material (101), the mesophase pitch (100) exhibits homogeneous nucleation and uniform anisotropic mesophase domain development, without reliance on externally sourced nucleating agents such as graphene or graphene oxide. (FIG.1A)
Disclaimer: Curated by HT Syndication.
