MUMBAI, India, Sept. 28 -- Intellectual Property India has published a patent application (202511017960 A) filed by Chairman, Defence Research & Development Organisation Drdo; and Indian Institute Of Technology, Delhi on February 28, 2025, for A Laser Interference Lithography Apparatus.
Inventors include Joseph, Joby; Devinder, Shital; Dr. Joseph, Shereena; and Pandey, Saurabh.
The application for the patent was published on September 25, 2026, under issue no. 39/2026.
Abstract: The present disclosure relates to a laser interference lithography apparatus (100). The laser interference lithography apparatus (100) includes a laser beam source (102) adapted to generate a line laser beam (108) and a platform (126). The platform (126) includes a first holder (122a) adapted to hold a substrate (122), and a third holder (124a) adapted to hold a mirror strip (124). Further, a mirror (120) is adapted to reflect a first portion of the line laser beam (108) at a location on the substrate (122), and a second portion of the line laser beam (108) to the mirror strip (124). Furthermore, the mirror strip (124) is adapted to reflect the second portion of the line laser beam (108) towards the substrate (122) to overlap the first portion of the line laser beam (108) to perform interference lithography at the location on the substrate (122).
Disclaimer: Curated by HT Syndication.
