MUMBAI, India, Sept. 14 -- Intellectual Property India has published a patent application (202641105923 A) filed by Dr. Tentu Nageswara Rao on September 03, 2026, for A Gc-Fid Method For Simultaneous Determination Of Endothall And Residual Stage-1 Process- Related Impurities.
Inventors include Dr. Tentu Nageswara Rao; Dr. Y. Prashanthi; and V. Sridhar.
The application for the patent was published on September 11, 2026, under issue no. 37/2026.
Abstract: ABSTRACT A GC-FID METHOD FOR SIMULTANEOUS DETERMINATION OF ENDOTHALL AND RESIDUAL STAGE-1 PROCESS-RELATED IMPURITIES The present invention relates to the field of analytical chemistry and, more particularly, to a gas chromatography-flame ionization detection (GC-FID) method for simultaneous determination of Endothall and one or more residual Stage-1 process-related impurities. The method comprises introducing a sample solution into a GC-FID system, chromatographically separating Endothall and the residual Stage-1 impurity on a capillary column, detecting the separated components as individual chromatographic peaks, and identifying and quantifying the components in a single chromatographic run. In a preferred embodiment, the separation is achieved using a DB-1MS capillary column, nitrogen as carrier gas, and a programmed oven temperature profile. The method provides separation of Stage-1 impurity and Endothall with retention times of approximately 1.87 minutes and 6.1 minutes, respectively, within a total run time of about 12.6 minutes. The method is useful for impurity profiling, in-process monitoring, purification assessment, process development, manufacturing control and quality control during production of Endothall. The method provides a rapid, reliable, reproducible and efficient analytical tool for determination of Endothall and residual Stage-1 process-related impurities.
Disclaimer: Curated by HT Syndication.
