MUMBAI, India, Sept. 28 -- Intellectual Property India has published a patent application (202611099601 A) filed by Dr. B. R. Ambedkar National Institute Of Technology on August 18, 2026, for A Dual-Flexible Chemo-Mechanical Magnetorheological Finishing (cmmrf) Tool.
Inventors include Dr Harpreet Singh; and Mr. Vineet Kumar.
The application for the patent was published on September 25, 2026, under issue no. 39/2026.
Abstract: The present invention discloses a dual-flexible chemo-mechanical magnetorheological finishing (CMMRF) tool (100) for nanofinishing a freeform workpiece surface (122). The tool (100) comprises a rotating spindle connection (114), a flexible upper tool holder (104), a finishing head (102) comprising a plurality of bristles (106), and a plurality of guide pillars (112) and a plurality of elastic members (110) extending between the flexible upper tool holder (104) and the finishing head (102). The plurality of guide pillars (112) and the plurality of elastic members (110) permit controlled axial and angular displacement of the finishing head (102). One or more magnetic field generating elements (116) associated with the plurality of bristles (106) generate localized magnetic fields to magnetize magnetic particles (126) within a magnetorheological polishing fluid (130), thereby retaining the magnetorheological polishing fluid (130) at a tool-workpiece interface to form a flexible magnetic abrasive brush. Cooperative interaction of structural flexibility and abrasive flexibility maintains conformal contact and substantially uniform finishing pressure for precision nanofinishing of freeform surfaces. FIG. 1A
Disclaimer: Curated by HT Syndication.