MUMBAI, India, July 25 -- Intellectual Property India has published a patent application (202517067069 A) filed by Chemetall Gmbh, Frankfurt, Germany, on July 14, for 'water-dilutable voc-free cleaning compositions.'
Inventor(s) include Jaen Franco, Miguel Angel; Rodrigo, Fco Javier; Yangues, Albert; and Espinos, David.
The application for the patent was published on July 25, under issue no. 30/2025.
According to the abstract released by the Intellectual Property India: "The present invention relates to A cleaning composition comprising: 40 to 90 wt.-% of glycol monoalkyl ethers (A), which are selected from the group consisting of mono alkylene glycol monoalkyl ethers (A1), dialkylene glycol monoalkyl ethers (A2), trialkylene glycol monoalkyl ethers (A3), and tetraalkylene glycol monoalkyl ethers (A4); 10 to 60 wt.-% of hydroxy carboxylic acids (B); 0 to 10 wt.-% of surface active agents (C); and 0 to 10 wt.-% of further ingredients (D) which differ from (A), (B) and (C); all the above ingredients having a vapor pressure at 20 C of less than 0.01 kPa, and/or an initial boiling point of more than 250 C at a pressure of 101.3 kPa; and all wt.-% values being based on the total weight of the cleaning composition, and the combined amount of all ingredients being 100 wt.-%. The invention further relates to a method for removing a non-cured aqueous coating material from a surface making use of such cleaning composition or its dilution in an aqueous medium. Furthermore, the invention relates to the use of the cleaning composition, or its dilution in an aqueous medium, for cleaning substrates to which non-cured aqueous coating materials adhere."
The patent application was internationally filed on Dec. 18, 2023, under International application No.PCT/EP2023/086390.
Disclaimer: Curated by HT Syndication.
