MUMBAI, India, June 13 -- Intellectual Property India has published a patent application (202517052025 A) filed by Basf Se, Ludwigshafen am Rhein, Germany, on May 29, for 'value chain return process for the recovery and of polymeric methylene phenylene amine (pmda) as its hci salt from the depolymerization of spend polyurethane and polyisocyanurate rigid foams.'
Inventor(s) include Schaub, Thomas; Schuette, Markus; Mattke, Torsten; Hashmi, A. Stephen K.; and Klein, Philippe.
The application for the patent was published on June 13, under issue no. 24/2025.
According to the abstract released by the Intellectual Property India: "The present invention is directed to a value chain return process comprising the depolymerization of a polyurethane and polyisocyanurate rigid foam based on polymeric methylenediphenyl diisocyanate (pMDI) to give a mixture (M1); distillative removal of volatile compounds from mixture (M1) to give a mixture (M2) comprising pMDA and at least one polyol; dissolution of the mixture (M2) in an aprotic organic solvent (S1) with a dipol moment in the range from 0.5*10-30 Cm to 7.8*10-30 Cm; and subsequent addition of HCl and separation of the pMDA-HCl salt. The present invention is also directed to the polymeric methylene phenylene amine (pMDA) and the polymeric methylenediphenyl diisocyanate (pMDI) obtained or obtainable according to said process as well as the use thereof for the preparation of polyurethanes or polyisocyanurates."
The patent application was internationally filed on Nov. 02, 2023, under International application No.PCT/EP2023/080534.
Disclaimer: Curated by HT Syndication.
