MUMBAI, India, June 6 -- Intellectual Property India has published a patent application (202517020667 A) filed by Topsoe A/S, Lyngby, Denmark, on March 7, for 'use of co2 rich gas as a sweeping gas in a chemical plant.'
Inventor(s) include Christensen Steffen Spangsberg.
The application for the patent was published on June 6, under issue no. 23/2025.
According to the abstract released by the Intellectual Property India: "A plant e.g. a syngas plant or hydrogen plant or a combined syngas and hydrogen plant is provided. The plant comprises a reforming section a CO2 removal section and a first electrolysis unit. A first portion of a first CO2 rich stream outputted from the CO2 removal section is arranged to be supplied to the anode of the first electrolysis unit as a sweeping gas for oxygen product gas. Certain streams downstream the first electrolysis unit are arranged to be fed to the reforming section as at least a portion of an oxygen rich feed. Various processes are also provided for the production of hydrogen and/or syngas in the plant."
The patent application was internationally filed on Dec. 14, 2023, under International application No.PCT/EP2023/085796.
Disclaimer: Curated by HT Syndication.
