Intellectual Property India Publishes Patent Application for 'Systems And Methods For Detecting Defects In Photolithographic Patterns' Filed by Samsung Electronics Co. Ltd.

MUMBAI, India, Sept. 5 -- Intellectual Property India has published a patent application (202441011195 A) filed by Samsung Electronics Co. Ltd., Gyeonggi, Republic of Korea, on Feb. 17, 2024, for 'systems and methods for detecting defects in photolithographic patterns.'

Inventor(s) include Adiga, Shashishekara Parampalli; Shinde, Prashant Pandurang; Kolake, Subramanya Mayya; Pai, Priyadarshini Panemangalore; Hwang, Myungsoo; and Park, Changmin.

The application for the patent was published on Sept. 5, under issue no. 36/2025.

According to the abstract released by the Intellectual Property India: "Disclosed are systems (403) and methods (1100) for detecting defects in photolithographic patterns. Initially for each of a plurality of scanning electron microscope (SEM) images (601) of photolithographic patterns, at least one periodic pattern is identified based on which a first pixel density map, followed by determining position of each peak and each trough in the first pixel density map. Further, second pixel density map is generated for a localized region in the first pixel density map. Furthermore, height and width of each peak and depth and width of each trough in the second pixel density map is compared with corresponding thresholds to identify defects with respect to peaks and troughs in the second pixel density map."

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