MUMBAI, India, Feb. 6 -- Intellectual Property India has published a patent application (202541134605 A) filed by Mohammed Naushad Ali; Ashma Parween; Hooman Hyat Ali; and Arshman Hayat Ali, Bangalore, Karnataka, on Dec. 31, 2025, for 'system and process for production of graphene and graphene-family nanomaterials.'
Inventor(s) include Mohammed Naushad Ali; Ashma Parween; Hooman Hyat Ali; and Arshman Hayat Ali.
The application for the patent was published on Feb. 6, under issue no. 06/2026.
According to the abstract released by the Intellectual Property India: "The invention provides an integrated wet-chemical system and process for production of graphene and graphene-family nanomaterials from diverse graphitic feedstocks, including natural, synthetic and waste graphite. The system comprises, in operative association, a feed preparation unit, hydrochloric-acid pretreatment reactor, jacketed oxidation reactor with controlled dosing and agitation, solid-liquid separation with counter-current washing, optional reduction unit, drying/dispersion unit, off-gas scrubbing system and effluent-treatment plant configured for wash-liquor recycle. A central control interface, optionally PLC/ML-assisted, enables formula-based selection of product grade few-layer graphene, graphene oxide or reduced graphene oxide by coordinated adjustment of temperature, reagent dosing, mixing intensity and residence time. The arrangement is modular and scalable from kilogram to tonne scale, reduces consumption of corrosive reagents and water versus conventional routes, and valorises scrapped graphite into high-value nanomaterials under environmentally compliant operation."
Disclaimer: Curated by HT Syndication.
