MUMBAI, India, Oct. 11 -- Intellectual Property India has published a patent application (202517092154 A) filed by Basf Se, Ludwigshafen am Rhein, Germany, on Sept. 25, for 'sunscreen compositions for protecting skin microbiome.'
Inventor(s) include Sohn, Myriam; and Gault, Manon.
The application for the patent was published on Oct. 10, under issue no. 41/2025.
According to the abstract released by the Intellectual Property India: "The invention relates to a sunscreen or daily care composition comprising a first UV filter, wherein the first UV filter is hexyl 2-[4-(diethylamino)-2-hydroxybenzoyl]benzoate (INCI diethylamino hydroxybenzoyl hexyl benzoate); and a second UV filter, wherein the second UV filter is selected from the group consisting of (Tris(2-ethylhexyl)-4,4',4''-(1,3,5-triazin-2,4,6- triyltriimino)tribenzoat) (INCI ethylhexyl triazon), 2,4-Bis-{[4-(2-ethyl-hexyloxy)-2-hydroxy]- phenyl}-6-(4-methoxyphenyl)-1,3,5-triazine (INCI bis-ethylhexyloxyphenol methoxyphenyl triazine), and mixtures thereof for use in a method of protecting the skin microbiome from damage by UV light irradiation."
The patent application was internationally filed on Feb. 28, 2024, under International application No.PCT/EP2024/055104.
Disclaimer: Curated by HT Syndication.
