MUMBAI, India, March 14 -- Intellectual Property India has published a patent application (202617019913 A) filed by Tokyo Electron Limited, Tokyo, on Feb. 20, for 'substrate processing system and substrate processing device.'
Inventor(s) include Amikura, Norihiko.
The application for the patent was published on March 13, under issue no. 11/2026.
According to the abstract released by the Intellectual Property India: "This substrate processing system is provided with: a vacuum conveyance module; a main interface unit having a first surface connected to the vacuum conveyance module, a second surface opposite to the first surface, an upper surface, and a lower surface; and a substrate processing module. The substrate processing module includes: a replaceable intermediate chamber unit having an upper surface and a lower surface; a replaceable upper chamber unit detachably connected to the upper surface of the replaceable intermediate chamber unit; and a replaceable lower chamber unit detachably connected to the lower surface of the replaceable intermediate chamber unit. The replaceable intermediate chamber unit includes: a chamber lateral wall structure body defining an internal space; a substrate support section disposed in the internal space; and an intermediate interface structure body detachably connected to the second surface of the main interface unit. The replaceable upper chamber unit includes: a chamber upper wall structure body defining the internal space and having a gas introduction port for introducing a processing gas into the internal space; and an upper interface structure body detachably connected to the upper surface of the main interface unit. The replaceable lower chamber unit includes: a chamber bottom wall structure body defining the internal space and having a gas discharge port for discharging a gas in the internal space; and a lower interface structure body detachably connected to the lower surface of the main interface unit."
The patent application was internationally filed on July 18, 2024, under International application No.PCT/JP2024/025748.
Disclaimer: Curated by HT Syndication.
