MUMBAI, India, Nov. 7 -- Intellectual Property India has published a patent application (202544041334 A) filed by Canon Kabushiki Kaisha, Tokyo, on April 29, for 'substrate processing method, substrate processing apparatus, and article manufacturing method.'
Inventor(s) include Akifumi Komukai.
The application for the patent was published on Nov. 7, under issue no. 45/2025.
According to the abstract released by the Intellectual Property India: "A substrate processing method includes performing prealignment of a substrate, and performing fine alignment of the substrate after the performing the prealignment, wherein the performing the prealignment includes calculating a plurality of amounts of positional deviation of the substrate in parallel by a plurality of methods, and the performing the fine alignment includes deciding a detection range of a mark formed on the substrate based on the plurality of calculated amounts of positional deviation."
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