MUMBAI, India, July 25 -- Intellectual Property India has published a patent application (202527060477 A) filed by Delta Galil Industries Ltd., Caesarea, Israel, on June 24, for 'socks with opaque regions and smoothly neighboring sheer regions that are free of yarn tails.'
Inventor(s) include Manaa Ahmad; and Naftaly Rotem.
The application for the patent was published on July 25, under issue no. 30/2025.
According to the abstract released by the Intellectual Property India: "A sock includes: an opaque fabric region that blocks passage of at least 90 percent of incoming light; immediately bordering and adjacent to a sheer fabric region that blocks passage of 25 to 75 percent of incoming light. The opaque fabric region and the sheer fabric region are a continuous fabric structure that is seam free and stitch free. Connection regions between the opaque fabric region and the sheer fabric region lack any seams and lack any stitches and lack any glue and lack any adhesive material. An inner side and also an outer side of connection regions between the opaque fabric region and the sheer fabric region are smooth and flush and lack any uncut remainder yarns."
The patent application was internationally filed on Nov. 21, 2023, under International application No.PCT/IL2023/051202.
Disclaimer: Curated by HT Syndication.
