MUMBAI, India, April 20 -- Intellectual Property India has published a patent application (202514083277 A) filed by Samsung Electronics Co. Ltd., Gyeonggi, Republic of Korea, on Sept. 2, 2025, for 'semiconductor device and method for fabricating the same.'
Inventor(s) include Kang, Yun Ho; Kong, Myung-Ho; Kim, Suk Hoon; Kim, Yeon Uk; Moon, Jun Hwan; and Lee, Do Sun.
The application for the patent was published on April 17, under issue no. 16/2026.
According to the abstract released by the Intellectual Property India: "A semiconductor device includes a substrate, a first wiring pattern on an upper surface of the substrate, and a second wiring pattern on the upper surface of the substrate. The first wiring pattern includes a first crystal and a second crystal adjacent to the first crystal in a horizontal direction. A crystal orientation of each of the first crystal and the second crystal is in a vertical direction perpendicular to the upper surface of the substrate. An interface between the first crystal and the second crystal extends in the vertical direction. The second wiring pattern is spaced apart from the first wiring pattern in the horizontal direction."
Disclaimer: Curated by HT Syndication.
