MUMBAI, India, Oct. 11 -- Intellectual Property India has published a patent application (202517058072 A) filed by Jusung Engineering Co. Ltd., Gyeonggi, Republic of Korea, on June 17, for 'semiconductor device and manufacturing method therefor.'
Inventor(s) include Cho, Won Tae; and Hwang, Chul Joo.
The application for the patent was published on Oct. 10, under issue no. 41/2025.
According to the abstract released by the Intellectual Property India: "The present invention relates to a semiconductor device and a manufacturing method therefor and, more specifically, to a manufacturing method for a semiconductor device having a semiconductor layer comprising gallium nitride. The semiconductor device according to an embodiment of the present invention comprises: a glass substrate; a crystalline seed layer formed on the glass substrate; and a semiconductor layer comprising gallium nitride and formed on the seed layer by an atomic layer deposition process."
The patent application was internationally filed on Nov. 27, 2023, under International application No.PCT/KR2023/019241.
Disclaimer: Curated by HT Syndication.
