MUMBAI, India, June 13 -- Intellectual Property India has published a patent application (202517051082 A) filed by Sicpa Holding Sa, Prilly, Switzerland, on May 28, for 'rylene-based uv curable security ink compositions.'
Inventor(s) include Pasquier, Cecile; Kaenel, Cindy; Cartesio, Salvatore; Bailleul, Mickael; Eligert, Laurent; and Vienet, Arnaud.
The application for the patent was published on June 13, under issue no. 24/2025.
According to the abstract released by the Intellectual Property India: "The invention relates to the field of UV curable security ink compositions comprising rylene-based compounds, radically curable monomers, oligomers or mixtures thereof, and radical photoinitiators. The invention further relates to security features obtained by applying or printing the security ink compositions, articles or documents containing said security features and method of preparing the security features comprising the UV curable security ink compositions."
The patent application was internationally filed on Nov. 03, 2023, under International application No.PCT/EP2023/080621.
Disclaimer: Curated by HT Syndication.
