MUMBAI, India, Oct. 11 -- Intellectual Property India has published a patent application (202517092152 A) filed by Kh Neochem Co. Ltd., Tokyo, on Sept. 25, for 'propylene glycol monomethyl ether acetate product.'
Inventor(s) include Kuramoto, Kouji.
The application for the patent was published on Oct. 10, under issue no. 41/2025.
According to the abstract released by the Intellectual Property India: "A propylene glycol monomethyl ether acetate product containing propylene glycol 1-monomethyl ether 2-acetate, acetic acid, and water, wherein a content of the acetic acid is 5 ppm or more and 50 ppm or less based on 100% by mass of the propylene glycol monomethyl ether acetate product, and a content of the water is 20 ppm or more and 250 ppm or less based on 100% by mass of the propylene glycol monomethyl ether acetate product."
The patent application was internationally filed on Dec. 07, 2023, under International application No.PCT/JP2023/043844.
Disclaimer: Curated by HT Syndication.
