MUMBAI, India, Feb. 6 -- Intellectual Property India has published a patent application (202511132209 A) filed by Indian Institute Of Technology, Roorkee, Uttarakhand, on Dec. 26, 2025, for 'process for recovering indium tin oxide.'
Inventor(s) include Dhawan, Nikhil; and Gahlot, Rohit.
The application for the patent was published on Feb. 6, under issue no. 06/2026.
According to the abstract released by the Intellectual Property India: "The present disclosure relates to a reagent-free, energy-efficient process for recovering ITO from ITO-containing materials. The process comprises obtaining an enriched ITO black mass from an ITO-coated glass substrate, subjecting the enriched ITO black mass to a first-stage pyrolysis under an inert gas atmosphere at 350-400 C to remove organic and halogen-containing impurities, followed by a second-stage pyrolysis under an inert gas atmosphere at 500-800 C to stabilize oxide phases. The inert gas atmosphere is subsequently replaced with an oxygen atmosphere at 500-800 C to oxidatively remove residual carbon and regenerate crystalline ITO."
Disclaimer: Curated by HT Syndication.
