Intellectual Property India Publishes Patent Application for 'Process For Preparing A N-Heterocyclic Carbene Based Dithiolene Radical Compound' Filed by Indian Institute Of Technology

MUMBAI, India, Jan. 9 -- Intellectual Property India has published a patent application (202541134713 A) filed by Indian Institute Of Technology, Chennai, Tamil Nadu, on Dec. 31, 2025, for 'process for preparing a n-heterocyclic carbene based dithiolene radical compound.'

Inventor(s) include Kartik Chandra Mondal; Christel Livia Mascarenhas; and Sujit Das.

The application for the patent was published on Jan. 9, under issue no. 02/2026.

According to the abstract released by the Intellectual Property India: "The present disclosure relates, in general, to the field of inorganic and organometallic chemistry. More particularly, the present disclosure relates to a process for the preparation of N-heterocyclic carbene (NHC)-based dithiolene radical ligands, including selenium-substituted dithiolene radicals, which exhibit improved stability, enhanced handling characteristics, and suitability for bulk isolation."

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