MUMBAI, India, Oct. 31 -- Intellectual Property India has published a patent application (202417030196 A) filed by Sumitomo Chemical Company, Ltd.; and Dover Chemical Corporation, Tokyo, on April 15, 2024, for 'polymeric composition having resistance to both nox discoloration and extrusion-processing degradation.'
Inventor(s) include Matsuoka, Fumiaki; Jakupca, Michael; Cook, Shawn; and Regula, John.
The application for the patent was published on Oct. 31, under issue no. 44/2025.
According to the abstract released by the Intellectual Property India: "A composition having: a themophastic; a first chemical compound having the structure: wherein, each R1, R2, R4, and R5 is independently selected and is a hydrogen atom, a C1-8 alkyl moiety, a C5-8 cycloalkyl moiety, a C6-12 alkylcycloalkyl moiety, a C7-12 arylalkyl moiety, or a C6-14 aryl moiety; each R3 is independently selected and is a hydrogen atom or a C1-8 alkyl moiety; X is a single bond, a sulfur atom, or a CHR6 moiety, wherein R6 is a hydrogen atom, a C1-8 alkyl moiety, or a C5-8 cycloalkyl moiety; A is a C2-8 alkylene moiety or an *COR7 moiety, wherein R7 is a single bond or a C1-8 alkylene moiety, and wherein the "*" character is used to confirm the positional understanding that the "C" atom in the "*COR7 moiety" is bonded to the adjacent "O" atom shown in the main structure; and one of Y and Z is a hydroxy moiety, a C1-8 alkoxy moiety or a C7-12 arylalkyloxy moiety, and the other is a hydrogen atom or a C1-8 alkyl moiety, and a second chemical compound having the structure: wherein each R1, R2, R3, R4 and R5 is independently selected and is a C10-18 alkyl moiety; n is an integer ranging from 3 to 11; and the sum of x1 + x2 is an integer ranging from 1-1000."
The patent application was internationally filed on Jan. 09, 2024, under International application No.PCT/US2024/010898.
Disclaimer: Curated by HT Syndication.
