MUMBAI, India, March 14 -- Intellectual Property India has published a patent application (202514079125 A) filed by Asahi Kasei Kabushiki Kaisha, Tokyo, on Aug. 20, 2025, for 'polyacrylonitrile porous hollow fiber membrane.'
Inventor(s) include Kayama Yuzo; Yoshidomi Shohei; Miki Yuki; and Nemoto Honoka.
The application for the patent was published on March 13, under issue no. 11/2026.
According to the abstract released by the Intellectual Property India: "An object of the present disclosure is to provide a polyacrylonitrile porous hollow fiber membrane with a molecular weight cut-off of 500,000 or more, suitable for internal pressure type cross-flow filtration. The polyacrylonitrile porous hollow fiber membrane of the present disclosure includes a minimum pore size layer in the vicinity of an inner surface, wherein the minimum pore size layer has an average pore size of 50 nm or more."
Disclaimer: Curated by HT Syndication.
