MUMBAI, India, Oct. 11 -- Intellectual Property India has published a patent application (202517062625 A) filed by Weir Science Limited, Auckland, New Zealand, on July 1, for 'pollen-based compositions and extracts for stimulating hyaluronic acid production.'

Inventor(s) include Weir, Iona Elizabeth.

The application for the patent was published on Oct. 10, under issue no. 41/2025.

According to the abstract released by the Intellectual Property India: "The invention relates to a pollen-based composition, or an extract derived therefrom, wherein the composition or extract stimulates the production of hyaluronic acid (HA). The composition or extract comprises at least glucose-6-phospate, as a substrate or precursor for the production of HA. The composition or extract of the invention also comprises other small molecular weight bioactive molecules and/or compounds selected from the group comprising flavonoids, flavonols, flavones, alkaloids, aglycones, glycosides, lipids, fatty acids, amino acids, anthranilic acid and isomers thereof, spermidine and isomers thereof, caffeoyl spermidine compounds, and hydroxycinnamic acids. The invention also relates to formulations comprising the pollen-based composition or extract which are useful for the treatment of a variety of conditions including skin conditions and skin aging, and symptoms of Genitourinary Syndrome of Menopause (GSM), including urinary incontinence, vaginal dryness, vaginal atrophy, irritation, itching, cracking, thinning, redness, inflammation and declining libido, sexual function, sexual response and/or pleasure."

The patent application was internationally filed on Dec. 01, 2023, under International application No.PCT/NZ2023/050143.

Disclaimer: Curated by HT Syndication.