MUMBAI, India, Sept. 5 -- Intellectual Property India has published a patent application (202348041424 A) filed by Applied Materials, Inc., Santa Clara, U.S.A., on June 19, 2023, for 'polishing carrier head with multiple angular pressurizable zones.'
Inventor(s) include Zuniga, Steven M.; Gurusamy, Jay; Nagengast, Andrew J.; and Galburt, Vladimir.
The application for the patent was published on Sept. 5, under issue no. 36/2025.
According to the abstract released by the Intellectual Property India: "A carrier head (140) for holding (10) a substrate in a polishing system, comprising: a housing (144); and a flexible membrane (182) extending below the housing, the flexible membrane dividing a volume above the flexible membrane into a multiplicity of independently pressurizable chambers (185) including a central chamber (185-66). An annular chamber (185-65) surrounding the central chamber, and a plurality of arcuate chambers (185-1 to 8 of each of S1 to S8) arranged in a polar array surrounding the central chamber and the annular chamber with the plurality of arcuate chambers arranged in one or more rings."
The patent application was internationally filed on June 25, 2021, under International application No.PCT/US2021/039265.
Disclaimer: Curated by HT Syndication.