MUMBAI, India, Aug. 8 -- Intellectual Property India has published a patent application (202517068428 A) filed by Basf Se, Ludwigshafen am Rhein, Germany, on July 17, for 'oxidation resistant membranes.'
Inventor(s) include Gronwald, Oliver; and Weber, Martin.
The application for the patent was published on Aug. 8, under issue no. 32/2025.
According to the abstract released by the Intellectual Property India: "The present invention relates to an oxidation resistant membrane comprising a poly(arylene ether nitrile) polymer (P), to its preparation and uses."
The patent application was internationally filed on Dec. 15, 2023, under International application No.PCT/EP2023/086176.
Disclaimer: Curated by HT Syndication.
