MUMBAI, India, Feb. 13 -- Intellectual Property India has published a patent application (202541124436 A) filed by Saveetha Institute Of Medical And Technical Sciences, Chennai, Tamil Nadu, on Dec. 10, 2025, for 'optimizing bipap therapy: development of a 3d printed flow regulating adapter.'
Inventor(s) include M. Adithya; Dr. Prasanth Gururaj; and Deepak Nallaswamy Veeraiyan.
The application for the patent was published on Feb. 13, under issue no. 07/2026.
According to the abstract released by the Intellectual Property India: "This study presents the development of a 3D-printed cylindrical flow-regulating adapter designed to optimize BiPAP therapy by converting non-vented masks into vented assemblies. The adapter features an internal movable flap that dynamically responds to airflow, enhancing the regulation of inspiratory and expiratory phases. Manufactured using additive printing technology, the connector ensures precision, lightweight construction, and rapid prototyping capabilities. The flap acts as a one-way valve, facilitating efficient exhalation while minimizing rebreathing and maintaining consistent positive airway pressure. Detailed design includes orthogonal views and an isometric model demonstrating the connector's dimensions f mechanical features, emphasizing its compatibility with existing BiPAP lines. This hfff9innovative adaptation aims to improve ventilation efficiency, patient comfort, and clinical versatility by enabling quick mask conversion without replacing existing equipment. The integration of 3D printing for custom flow regulation devices offers a promising approach to enhancing noninvasive ventilation therapies in diverse clinical settings."
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