MUMBAI, India, May 29 -- Intellectual Property India has published a patent application (202641063276 A) filed by K. Rohitha; Dr. Y. Bharathi; Dr. Ch. Shilpa Chakra; Dr. P. Jagan Mohan Rao; Dr. K. Parimala; Dr. P. Sujatha; and Dr. Sncvl Pushpavalli, Nandyal, Andhra Pradesh, on May 19, for 'onion-scale mediated nanopriming for heat stress tolerance in chickpea.'
Inventor(s) include K. Rohitha; Dr. Y. Bharathi; Dr. Ch. Shilpa Chakra; Dr. P. Jagan Mohan Rao; Dr. K. Parimala; Dr. P. Sujatha; and Dr. Sncvl. Pushpavalli.
The application for the patent was published on May 29, under issue no. 22/2026.
According to the abstract released by the Intellectual Property India: "The present invention relates to a green nanotechnology-based method for enhancing heat stress tolerance in chickpea through nano-seed priming using onion scale-mediated zinc oxide (ZnO), copper oxide (CuO), and potassium nanoparticles. The nanoparticles are synthesized via eco-friendly methods and applied at optimized concentrations to improve germination, seedling vigor, antioxidant enzyme activity, and stress resilience under elevated temperatures. The invention demonstrates improved physiological and biochemical performance, including enhanced SOD, CAT, proline, and flavonoid activity, enabling sustainable crop productivity under climate-induced heat stress. The method is cost-effective, scalable, and suitable for agricultural applications."
Disclaimer: Curated by HT Syndication.
