MUMBAI, India, June 13 -- Intellectual Property India has published a patent application (202517050632 A) filed by Jsw Aktina System Co. Ltd., Kanagawa, Japan, on May 27, for 'observation device, observation method, and method for manufacturing semiconductor device.'
Inventor(s) include Yamaguchi Yoshihiro; and Ito Daisuke.
The application for the patent was published on June 13, under issue no. 24/2025.
According to the abstract released by the Intellectual Property India: "An observation device (100) according to the present embodiment comprises: a mechanism for levitating or supporting a substrate (16) such that a space is formed directly below the substrate; a conveyance mechanism for conveying the substrate on the mechanism in a conveyance direction; an observation unit (50) that comprises an optical detector (52) that detects light from the substrate (16) and an optical system (51) that guides the light from the substrate (16) to the optical detector (52); and a movement mechanism (55) that moves the observation unit (50) in a direction inclined to the conveyance direction in a top view."
The patent application was internationally filed on Dec. 20, 2022, under International application No.PCT/JP2022/046920.
Disclaimer: Curated by HT Syndication.
