MUMBAI, India, May 30 -- Intellectual Property India has published a patent application (202517014434 A) filed by Aurora; and Universite De Reims Champagne-Ardenne, Rouen, France, on Feb. 19, for 'non-thermal plasma cleaning device and cleaning method.'
Inventor(s) include Parias, Thomas; Le Bras, Florian; and Gelle, Marie-Paule.
The application for the patent was published on May 30, under issue no. 22/2025.
According to the abstract released by the Intellectual Property India: "A non-thermal plasma cleaning device (12) including: - an enclosure (16) including an input port (30) for fluid connection with a gas supply; - a radio-wave source (18); - a controller (22) configured to successively perform, during a cleaning step, at least two, preferably at least three, non-thermal plasma generation cycles each comprising: controlling the radio-wave source (18) to be in an active state during a first predetermined duration to generating a non-thermal plasma in the enclosure (16); and controlling the radio-wave source (18) to be in an inactive state during a second predetermined duration, the input port (30) being in an open state at least during the second predetermined duration."
The patent application was internationally filed on July 07, 2023, under International application No.PCT/EP2023/068900.
Disclaimer: Curated by HT Syndication.
