MUMBAI, India, Oct. 11 -- Intellectual Property India has published a patent application (202517061475 A) filed by Kolon Industries, Inc., Seoul, Republic of Korea, on June 27, for 'nanomembrane, waterproof ventilation sheet comprising same, and method for manufacturing nanomembrane.'
Inventor(s) include Choi, Samuel; Kim, Sung Jin; Oh, Heung Ryul; and Hwang, Yeong Nam.
The application for the patent was published on Oct. 10, under issue no. 41/2025.
According to the abstract released by the Intellectual Property India: "The present invention relates to a nanomembrane, a waterproof ventilation sheet comprising same, and a method for manufacturing the nanomembrane, wherein the nanomembrane is formed of synthetic fibers, with carbon black contained in a content of less than 15 wt% relative to the total weight of the synthetic fibers, the aspect ratio of carbon black particles being 1.0 to 5, and the nanomembrane has a water entry pressure of 5,000 mmH2O to 15,000 mmH2O and an air permeability of 1 cm3/cm2/sec (ccs) to 10 cm3/cm2/sec."
The patent application was internationally filed on Dec. 21, 2023, under International application No.PCT/KR2023/021273.
Disclaimer: Curated by HT Syndication.
