MUMBAI, India, Aug. 8 -- Intellectual Property India has published a patent application (202411004776 A) filed by Council Of Scientific And Industrial Research, New Delhi, on Jan. 23, 2024, for 'modified photocurable peek photopolymer for 3d printing and preparations thereof.'
Inventor(s) include Asha Syamakumari; Shibam Pal; and Yogesh Mohan Gaikwad.
The application for the patent was published on Aug. 8, under issue no. 32/2025.
According to the abstract released by the Intellectual Property India: "The present invention relates to a novel photocurable acrylate PEEK (Polyether ether ketone) polymer with a modified chemical structure of formula I, useful in DLP (digital light processing) 3D printing. Formula-I wherein Ar is an aromatic unit, R is radical polymerizable unit, and x is in the range of 10 to 50."
Disclaimer: Curated by HT Syndication.
