Intellectual Property India Publishes Patent Application for 'Modified Copolyesters Having Improved Drop Impact, Methods For Making The Same, And Molded Articles Made Therefrom' Filed by Alpek Polyester USA, Llc

MUMBAI, India, April 20 -- Intellectual Property India has published a patent application (202517081604 A) filed by Alpek Polyester USA, Llc, Charlotte, U.S.A., on Aug. 28, 2025, for 'modified copolyesters having improved drop impact, methods for making the same, and molded articles made therefrom.'

Inventor(s) include Ardakani, Kazem Majdzadeh; Salazar Hernandez, Damian Adrian; West, Barry L.; and Kezios, Peter S.

The application for the patent was published on April 17, under issue no. 16/2026.

According to the abstract released by the Intellectual Property India: "A copolyester is provided containing a diacid/diester component having from 70 to 99 mol% terephthalic units, and from 1 to 30 mole% of non-terephthalic based diacid/diester units, based on total diacid/diester component, and a diol component having from 1 to 15 mole% of a diol containing a cyclohexylene group, and from 82 to 99 mole% ethylene glycol, and from 0 to 3 mole% diethylene glycol (DEG), based on total diol component, articles made therefrom and methods of making the copolyester."

The patent application was internationally filed on Oct. 07, 2024, under International application No.PCT/US2024/050219.

Disclaimer: Curated by HT Syndication.